• 专利标题:   Field effect transistor comprises a substrate and a graphene layer that is provided on the substrate, where drain electrode is provided on the graphene layer and a gate insulating film is provided on the graphene layer.
  • 专利号:   US2018130912-A1, JP2018078146-A
  • 发明人:   TATENO Y, UENO M, OKADA M, MITSUHASHI F, SUEMITSU M, FUKLDOME H, MIHASHI F, FUKIDOME H
  • 专利权人:   SUMITOMO ELECTRIC IND LTD, UNIV TOHOKU, SUMITOMO ELECTRIC IND LTD, UNIV TOHOKU
  • 国际专利分类:   H01L029/786, H01L027/088, H01L029/66, H01L029/16, H01L029/423, H01L021/02, H01L029/49, H01L021/82, H01L021/336, H01L029/78, H01L051/05, H01L051/30, H01L051/40
  • 专利详细信息:   US2018130912-A1 10 May 2018 H01L-029/786 201834 Pages: 8 English
  • 申请详细信息:   US2018130912-A1 US804677 06 Nov 2017
  • 优先权号:   JP217291

▎ 摘  要

NOVELTY - The field effect transistor comprises a substrate (10) and a graphene layer (12) that is provided on the substrate. A drain electrode (26) is provided on the graphene layer. A gate insulating film (14) is provided on the graphene layer. Multiple gate electrodes (20,22) are provided on the gate insulating film. A supplemental electrode (28) is in contact with the graphene layer. The second gate electrode is short-circuited with the source electrode. USE - Field effect transistor. ADVANTAGE - The field effect transistor comprises a substrate and a graphene layer that is provided on the substrate, where drain electrode is provided on the graphene layer and a gate insulating film is provided on the graphene layer, and thus enables to improve the drain conductance, reduces the drain conductance, increases the high frequency performance and reduces drain access resistance. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a field effect transistor. Substrate (10) Graphene layer (12) Gate insulating film (14) Gate electrodes (20,22) Drain electrode (26) Supplemental electrode (28)