• 专利标题:   Preparation of reduction-oxidation graphene oxide/cerium dioxide nano chunk involves oxidizing graphene initial reactant into deionized water, adding aqueous solution of oxidized graphene, cleaning with alcohol and drying.
  • 专利号:   CN103553032-A, CN103553032-B
  • 发明人:   HUANG K, LIU G, ZHANG R, XIAO J, LEI M
  • 专利权人:   UNIV BEIJING POSTS TELECOM
  • 国际专利分类:   C01B031/04, C01F017/00
  • 专利详细信息:   CN103553032-A 05 Feb 2014 C01B-031/04 201426 Pages: 7 Chinese
  • 申请详细信息:   CN103553032-A CN10547523 06 Nov 2013
  • 优先权号:   CN10547523

▎ 摘  要

NOVELTY - Preparation of reduction-oxidation graphene oxide/cerium dioxide nano chunk involves oxidizing graphene initial reactant into deionized water, obtaining brown graphene oxide aqueous solution, adding aqueous solution of oxidized graphene, adding cerium nitrate hexahydrate solid, obtaining homogeneous dispersion of cerium nitrate/graphene oxide mixed solution, transferring mixed solution to polytetrafluoroethylene substrate, adding toluene, oleic acid and ethylenediamine, cleaning black solid product with alcohol and deionized water, and drying in vacuum oven. USE - Preparation of reduction-oxidation graphene oxide/cerium dioxide nano chunk (claimed). ADVANTAGE - The reduction-oxidation graphene oxide/cerium dioxide nano chunk is easily and economically prepared with high purity. DETAILED DESCRIPTION - Preparation of reduction-oxidation graphene oxide/cerium dioxide nano chunk involves oxidizing graphene initial reactant into the deionized water, ultrasonically dispersing for 1-3 hours after centrifugal separation, obtaining brown graphene oxide aqueous solution with concentration of 0.2-2 g/L, adding 20 ml aqueous solution of oxidized graphene, adding 0.1-2 mmol cerium nitrate hexahydrate solid, continuing stirring for 1-3 hours, obtaining homogeneous dispersion of cerium nitrate/graphene oxide mixed solution, transferring mixed solution to 50 ml polytetrafluoroethylene substrate, adding 8-18 ml toluene, 1-3 mL oleic acid and 0.1-0.3 ml ethylenediamine, placing lid into the reactor, transferring to seal resistance box at rate of resistance of 1 degrees C/minute at 60-100 degrees C and held for 30-90 minutes, reacting at oven temperature resistance rate of 2 V/minute at 120-200 degrees C, maintaining constant reaction temperature for 12-48 hours, cleaning black solid product with alcohol and deionized water, and drying at 60 degrees C in a vacuum oven for 6 hours.