▎ 摘　　要

NOVELTY - The method involves arranging a graphene layer (114) having an exposed planar surface (101) proximate to a magnetron assembly (102) that is operative to emit a plasma plume (106) along a line (108). The exposed planar surface of the graphene layer is arranged at an angle that is non-orthogonal to the line that intersects the exposed planar surface. The plasma plume is emitted from the magnetron assembly such that a layer of deposition material is formed on the graphene layer without appreciably damaging the graphene layer. USE - Method for depositing a material on a graphene layer during fabrication of a spintronic device. Can also be used for a FET. ADVANTAGE - The method ensures that the deposition material can be efficiently deposited on the graphene layer without appreciably damaging the graphene layer. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for fabricating a spintronic device. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a sputtering system. Exposed planar surface (101) Magnetron assembly (102) Plasma plume (106) Lines (108, 110) Graphene layer (114)