• 专利标题:   Formation of graphene-boron nitride interface used in e.g. formation of graphene-boron nitride heterostructure, involves exposing ruthenium substrate to ethylene, and sequentially exposing resultant substrate to oxygen and borazine.
  • 专利号:   US2015044367-A1, US9410243-B2
  • 发明人:   SUTTER P W, SUTTER E A
  • 专利权人:   BROOKHAVEN SCI ASSOC LLC
  • 国际专利分类:   C23C016/26, C23C016/34, C23C016/44, H01L021/02, C01B031/04, C01B035/14, C30B025/02, C30B025/18, C30B029/02
  • 专利详细信息:   US2015044367-A1 12 Feb 2015 C23C-016/34 201518 Pages: 21 English
  • 申请详细信息:   US2015044367-A1 US453314 06 Aug 2014
  • 优先权号:   US862815P, US453314

▎ 摘  要

NOVELTY - Formation of graphene-boron nitride interface involves exposing ruthenium substrate to ethylene, exposing the resultant ruthenium substrate to oxygen, and exposing the ruthenium substrate to borazine. USE - Formation of graphene-boron nitride interface used in formation of graphene-boron nitride heterostructure and synthesis of tunable homogeneous ternary carbon-boron-nitrogen alloy phase used as two-dimensional membrane (all claimed) for white light-emitting diode for optoelectronic device. ADVANTAGE - The method enables formation of graphene-boron nitride interface with reduced intermixing along boundary interfaces. The heterostructure formed using the graphene-boron nitride interface is capable of emitting deep ultraviolet radiation. The structure of monolayer graphene and hexagonal boron nitride are closely aligned in-plane, consistent with micro low-energy electron diffraction. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) formation of graphene-boron nitride heterostructure; and (2) synthesis of tunable homogeneous ternary carbon-boron-nitrogen alloy phase.