• 专利标题:   Phototransistor for use in an imaging device, comprises a source electrode and a drain electrode spaced apart from each other on a substrate, where a photosensitive channel layer is disposed on the substrate and connects the source electrode.
  • 专利号:   KR2021116126-A
  • 发明人:   KIM D, CHANGSOONCHOI, KIM M
  • 专利权人:   UNIV SEOUL NAT R DB FOUND, BASIC SCI INST
  • 国际专利分类:   H01L031/10, H01L031/12
  • 专利详细信息:   KR2021116126-A 27 Sep 2021 H01L-031/10 202183 Pages: 20
  • 申请详细信息:   KR2021116126-A KR032894 17 Mar 2020
  • 优先权号:   KR032894

▎ 摘  要

NOVELTY - The phototransistor has a board. A source electrode and a drain electrode are spaced apart from each other on the substrate. A photosensitive channel layer is arranged on the substrate and connecting the source electrode and the drain electrode. A dielectric layer is arranged over the photosensitive channel layer. A gate electrode is arranged over the dielectric layer. The dielectric layer is formed of poly(1,3,5-trimethyl-1,3,5-trivinyl cyclotrisiloxane) (pV3D3). The source electrode and the drain electrode are formed of graphene. USE - Phototransistor for imaging device (claimed). ADVANTAGE - The efficiency of the image pattern recognition process is improved by identifying image patterns in a series of light inputs without unnecessary data communication, storage and processing. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an imaging device. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view shows the structure of pV3D3-PTr.