▎ 摘 要
NOVELTY - Forming a graphene structure, comprises: forming a body comprising at least one protrusion, and forming a graphene layer at an outer peripheral surface of at least one protrusion (106); or forming at least one cylindrical opening in a body, where a diameter of the opening is represented by (d=78.3x ((n+m)2-nx m)0.5) pm, where n and m are integer values, at least one of n and m is greater than 0, and forming a graphene layer at an inner peripheral surface of the at least one opening. USE - The method is useful for forming a graphene structure (claimed). ADVANTAGE - The method produces graphene structure with accurate pre-defined shape. DESCRIPTION OF DRAWING(S) - The figures 1a, 1b and 1c show the schematic process flow of the method for forming a graphene structure. Semiconductor body (102) Masking structure (104) Protrusion (106) First surface (1021) Second surface (1022)