• 专利标题:   Flexible phototherapy mask, has first transparent substrate that is set between second graphene and first light emitting unit, and first lead layer that comprises second power supply line for supplying power to first light unit.
  • 专利号:   CN217661132-U
  • 发明人:   WEI S, GAO Z, WANG Y, LIU R, MA Y
  • 专利权人:   BEIJING YEOLIGHT TECHNOLOGY CO LTD
  • 国际专利分类:   A61N005/06
  • 专利详细信息:   CN217661132-U 28 Oct 2022 A61N-005/06 202289 Chinese
  • 申请详细信息:   CN217661132-U CN21011875 24 Apr 2022
  • 优先权号:   CN21011875

▎ 摘  要

NOVELTY - The embodiment of the utility model claims a flexible phototherapy mask. The flexible phototherapy mask includes a flexible mask body and a lip care device; the flexible mask main body comprises a lip hollow area, the lip nursing device is matched with the lip hollow area, the area of the lip nursing device is greater than or equal to the area of the lip hollow area. The flexible phototherapy mask of the embodiment of the utility model can be directly worn on the face to beautification, it can be curled and contained, convenient to carry; increasing the lip nursing module for beautifying the lip, realizing multifunctional effect, more use requirement of the user satisfy