• 专利标题:   Method for growing island-shaped graphene sheet using high dielectric medium, involves cleaning graphene sample to remove impurity, and forming high dielectric medium thin film on sample using atom layer deposition process.
  • 专利号:   CN103915327-A, CN103915327-B
  • 发明人:   SHEN Y, WEI H, YANG S, ZHOU P
  • 专利权人:   UNIV FUDAN
  • 国际专利分类:   H01L021/02, H01L021/285
  • 专利详细信息:   CN103915327-A 09 Jul 2014 H01L-021/285 201465 Pages: 5 Chinese
  • 申请详细信息:   CN103915327-A CN10078022 05 Mar 2014
  • 优先权号:   CN10078022

▎ 摘  要

NOVELTY - The method involves forming small round spot of island-shaped graphene sheet on single layer graphene using graphene suspension key. The graphene thin film is deposited using atom layer deposition process. The island-shaped graphite of graphene sample is provided using high dielectric medium. The graphene sample is cleaned to remove the impurity. The high dielectric medium thin film is formed on the sample using the atom layer deposition process. USE - Method for growing island-shaped graphene sheet using high dielectric medium during manufacturing of carbon-based integrated circuit. ADVANTAGE - The growing process is performed easily and conveniently. The high dielectric medium thin film is formed efficiently on the graphene. The electrical property of the graphene is increased. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the process for growing island-shaped graphene sheet using high dielectric medium. (Drawing includes non-English language text)