▎ 摘　　要

NOVELTY - A suspended graphene film structure is prepared by coating poly(methyl methacrylate) (PMMA) on surface of copper-based graphene film to obtain copper-based/graphene/PMMA structure, adding into copper etching solution, etching and removing copper substrate to obtain PMMA/graphene structure, transferring to silicon-based cavity structure to obtain PMMA/graphene/silicon structure, spin coating photoresist on PMMA surface, photoetching and developing, oxygen plasma patterning graphene structure, and removing photoresist and PMMA with acetone. USE - The method is used for preparing suspended graphene film structure. ADVANTAGE - The method can reduce manufacturing difficulty of suspended graphene, has success rate and ensures covering integrity of suspended graphene film structure.