▎ 摘　　要

NOVELTY - Forming graphene oxide pattern, comprises preparing a substrate, forming hydrophobic self-assembling monomolecular film on a surface of the substrate, covering the hydrophobic self-assembling monomolecular film using a mask, employing an UV lamp to expose, removing the mask after the exposure to obtain a substrate with the surface containing patterned self-assembling monomolecular film template, covering the patterned self-assembling monomolecular film template with graphene oxide aqueous solution and then drying, and forming graphene oxide pattern on the surface of the substrate. USE - The method is useful for forming graphene oxide pattern, which is useful for preparing a graphene pattern. ADVANTAGE - The method is capable of economically forming the graphene oxide pattern with high efficiency. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for forming a graphene pattern comprising heating the graphene oxide pattern at 800-1000 degrees C for 15-60 minutes in a reducing atmosphere.