▎ 摘　　要

NOVELTY - The device has a bottom plate (1) provided with a fixed column (2), a lower clamp and an upper clamp. A location hole is formed on the lower clamp that is fixed with a square block. An etching liquid flow unit etches a catalytic substrate. The upper clamp is provided with the square block according to length width size of the square block. The location hole is formed on the fixed column. The lower clamp and the upper clamp are provided with the bottom plate. Diameter of the fixing column is 0.1-3cm. The lower clamp and the upper clamp are made of acid and alkali resistant corrosion rubber. USE - Chemical gas phase deposition transferring graphene thin film tooling device. ADVANTAGE - The device has better catalytic base etching effect of the graphene thin film, high production efficiency, simple structure and easy manufacturing process. DESCRIPTION OF DRAWING(S) - The drawing shows a side perspective view of a chemical gas phase deposition transferring graphene thin film tooling device. Bottom plate (1) Fixed column (2)