• 专利标题:   Non-adhesion graphene preparing metal foil layer stacking method, involves stacking layers of metal foil, separating metal foil, and utilizing chemical vapor deposition in each surface of metal foil stacked structure to prepare graphene.
  • 专利号:   CN106591798-A
  • 发明人:   ZHANG Y, YU G, SUI Y, CHEN Z, DENG R, GE X, LIANG Y, HU S
  • 专利权人:   SHANGHAI INST MICROSYSTEM INFORMATION
  • 国际专利分类:   C01B032/186, C23C016/26
  • 专利详细信息:   CN106591798-A 26 Apr 2017 C23C-016/26 201731 Pages: 9 Chinese
  • 申请详细信息:   CN106591798-A CN11129914 09 Dec 2016
  • 优先权号:   CN11129914

▎ 摘  要

NOVELTY - The method involves stacking two layers of a metal foil (S11). The metal foil is separated by intercalation. A metal foil stacking structure is formed. An inserting layer is reacted with metal foil material. Chemical vapor deposition is utilized (S12) in each surface of the metal foil stacked structure to prepare graphene. Carbon-containing gas temperature is measured for about 800-1080 degree Celsius. The metal foil is provided with copper and copper alloy. The copper alloy is contained with copper-nickel alloy, copper-tin alloy, copper- ruthenium alloy and copper molybdenum alloy. USE - Non-adhesion graphene preparing metal foil layer stacking method. ADVANTAGE - The method enables avoiding mutual adhesion between the metal foil can be disposable in the CVD apparatus chamber into a lot of metal foil, which greatly improves the growth efficiency of graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a non-adhesion graphene preparing metal foil layer stacking method. '(Drawing includes non-English language text)' Step for stacking two layers of a metal foil (S11) Step for utilizing chemical vapor deposition in each surface of the metal foil stacked structure to prepare graphene (S12)