▎ 摘　　要

NOVELTY - Preparation of multilayer composite photosensitive artificial skin sensor involves forming a biocompatible silk fibroin film layer on a pretreated silicon wafer substrate by spin coating silk fibroin and drying, forming a film using aqueous solution of azobenzene-graphene oxide-silver nanocomposite, drying, forming a polydimethylsiloxane film, and drying. The azobenzene-graphene oxide-silver nanocomposite aqueous solution is prepared by adding pulverized graphene to hydrogen iodide/acetic acid solution, drying, placing the resultant sample in toluene, centrifuging, water washing, ultrasonically dispersing in water, adding silver nitrate solution, reacting, adding sodium hydroxide solution, adjusting pH to 11-12, centrifuging, collecting the precipitate, washing with ethanol and water to obtain a graphene oxide-silver nanocomposite, adding the nanocomposite to water, adding cationic azobenzene surfactant, centrifuging and ultrasonically dispersing in water. USE - Preparation of multilayer composite photosensitive artificial skin sensor. ADVANTAGE - The method provides multilayer composite photosensitive artificial skin sensor having excellent biocompatibility, physical and mechanical properties and photoresponsive performance. The change in resistance of the sensor occurs under the action of certain external force and light. DETAILED DESCRIPTION - Preparation of multilayer composite photosensitive artificial skin sensor involves forming a biocompatible silk fibroin film layer on a pretreated silicon wafer substrate by spin coating silk fibroin and drying, forming a film by spin coating aqueous solution of azobenzene-graphene oxide-silver nanocomposite, drying at 40-80 degrees C in an oven, forming a polydimethylsiloxane film and drying. The azobenzene-graphene oxide-silver nanocomposite aqueous solution is prepared by adding milled and pulverized graphene to hydrogen iodide/acetic acid solution, mixing to obtain solution having a concentration of 0.1-0.5 g/ml, freeze drying, placing the resultant freeze-dried sample in toluene for 1-4 hours, to obtain crushed graphene sponge, placing the graphene sponge in a centrifuge, centrifuging at 3000-8000 rpm, washing 2-5 times with deionized water for 2-5 minutes, ultrasonically dispersing the graphene sponge in deionized water to prepare a dispersion having a concentration of 0.1-1 mol/L, adding 0.1-1 mol/L silver nitrate solution, reacting for 1-3 hours, adding 0.1 mol/L sodium hydroxide solution, adjusting pH to 11-12, placing the mixed solution in an oil bath at 40-80 degrees C for 20-50 minutes, centrifuging, collecting the precipitate, washing with absolute ethanol and deionized water to obtain a graphene oxide-silver nanocomposite, adding the nanocomposite to deionized water to obtain 0.5-2 mM dispersion, slowly adding 0.05-1 g cationic azobenzene surfactant to 100 ml resultant dispersion, ultrasonically processing at room temperature for 1-3 hours, centrifuging, adding deionized water, centrifuging, collecting the lower layer precipitate, and ultrasonically dispersing in 100 ml deionized water for 20 minutes. The pretreated silicon wafer substrate is prepared by subjecting a substrate to release treatment, placing the substrate in an evaporating dish, uniformly coating 1 ml or more trimethylchlorosilane liquid on a bottom of the evaporating dish, closing the dish, and evaporating for 10 minutes. The silk fibroin is prepared by heating waste silk, removing sericin using 0.5% sodium carbonate solution, adding 0.5 g/ml calcium chloride solution to the resultant degummed silk, heating at 70-80 degrees C, dialyzing the resultant silk fibroin aqueous solution through a dialysis bag, and concentrating to 10 wt.% by heating under magnetic stirring at 40-45 degrees C.