• 专利标题:   Electrochemical polishing method of graphene film, involves taking substrate-to-be-polished as anode and insoluble metal as cathode, and electrolyzing, where electrolyte contains mixed liquid of phosphoric acid and sulfuric acid.
  • 专利号:   CN107119313-A
  • 发明人:   ZHANG Z, CHEN C, YAN J, ZHAO W, XU M, WANG Y, LIU C
  • 专利权人:   UNIV NORTHWEST
  • 国际专利分类:   C23C014/02, C23C014/06, C25F003/22, C25F007/00
  • 专利详细信息:   CN107119313-A 01 Sep 2017 C25F-007/00 201770 Pages: 24 Chinese
  • 申请详细信息:   CN107119313-A CN10118005 01 Mar 2017
  • 优先权号:   CN10118005

▎ 摘  要

NOVELTY - The electrochemical polishing method involves taking a substrate-to-be-polished as an anode and insoluble metal as cathode, and electrolyzing, where the electrolyte for electrolysis comprises mixed liquid of phosphoric acid, sulfuric acid, deionized water and polyethylene glycol. USE - Electrochemical polishing method of graphene film (claimed). ADVANTAGE - The method enables electrochemical polishing with high repeatability and effectively improved substrate surface topography, removes small scratches, and eliminates the substrate surface defects. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) electrochemical polishing platform; and (2) preparation method of graphene film.