▎ 摘　　要

NOVELTY - Preparing copper substrate based on cleaning process involves providing a copper substrate for preparing graphene, treating copper substrate in the aerobic environment to oxidize copper substrate surface to form a copper oxide layer, and then placing the oxidized copper substrate in a reaction solution of copper oxide to remove the copper oxide layer containing impurities by etching to obtain a copper substrate with clean surface. USE - Method for preparing copper substrate based on cleaning process for manufacturing chemical vapor deposition (CVD) graphene (claimed), reducing the defects in the graphene, and preparing high-quality graphene. ADVANTAGE - The method enables to prepare copper substrate based on cleaning process, in simple manner with high reproducibility, and strong controllability, is suitable for batch processing, and has industrial applicability.