• 专利标题:   Producing graphene laminate pattern, comprises e.g. forming metal thin film pattern on a substrate, depositing a graphene layer on the metal thin film pattern by chemical vapor deposition method, and forming graphene pattern on substrate.
  • 专利号:   KR2017003507-A, KR1772011-B1
  • 发明人:   JUNG J, PARK J
  • 专利权人:   UNIV SEJONG IND ACAD COOP FOUND
  • 国际专利分类:   H01B013/00, C01B031/04
  • 专利详细信息:   KR2017003507-A 09 Jan 2017 H01B-013/00 201715 Pages: 24
  • 申请详细信息:   KR2017003507-A KR179974 27 Dec 2016
  • 优先权号:   KR165163

▎ 摘  要

NOVELTY - Producing graphene laminate pattern, comprises (a) forming a metal thin film pattern having thickness of 10-100 nm on a substrate, (b) depositing a graphene layer on the metal thin film pattern by chemical vapor deposition method, and evaporating the metal thin film pattern to form a graphene pattern on the substrate, and (c) repeating the step (a) and (b) for at least two times to produce laminate pattern. The graphene laminate pattern is provided with graphene mesh or graphene grid. USE - The method is useful for producing graphene laminate pattern (claimed).