• 专利标题:   Laser array based graphene capacitor manufacturing device, has displacement addressing mechanism for controlling work platform, and laser array device provided with laser emitter, X-Y optical scanning head and optical reflecting lens.
  • 专利号:   CN106847538-A, CN106847538-B
  • 发明人:   WANG F
  • 专利权人:   WANG F
  • 国际专利分类:   H01G011/32, H01G011/36, H01G011/86, H01G013/00
  • 专利详细信息:   CN106847538-A 13 Jun 2017 H01G-011/32 201751 Pages: 7 Chinese
  • 申请详细信息:   CN106847538-A CN10028682 16 Jan 2017
  • 优先权号:   CN10028682

▎ 摘  要

NOVELTY - The device has a displacement addressing mechanism fixed on a machine frame. A graphene oxide solution coating apparatus, a dielectric film material application apparatus, an anode material coating device and a cleaning device are connected with each other. The displacement addressing mechanism controls the work platform. A drying device performs heat radiation process in the work platform. A laser array device is provided with a laser emitter, an X-Y optical scanning head and an optical reflecting lens. USE - Laser array based graphene capacitor manufacturing device. ADVANTAGE - The device realizes dielectric film material coating and curing process and anode material coating and curing process so as to manufacture single graphene capacitor in an effective manner, and has reasonable structure, flexible and controllable process, simple and quick manufacture operation, less production cost and moderate condition. DESCRIPTION OF DRAWING(S) - The drawing shows a side perspective view of a laser array based graphene capacitor manufacturing device. '(Drawing includes non-English language text)'