▎ 摘　　要

NOVELTY - The method involves depositing graphene oxide film on the first surface of a substrate (S110). A first haze film is deposited on the graphene oxide film (S130). A second haze film is deposited between the first surface of the substrate and the first haze film. The first and second haze layers are deposited by alternately repeating the steps of depositing silicon oxides and silicon nitride film. A chamber is evacuated between the depositing steps. A mixture of 90-99.9 wt.% cyclohexanone and 0.1-10 wt.% graphene oxide is prepared by vaporizing the mixture and supplying the mixture to the chamber. An aluminum film is deposited on the second surface of the substrate. USE - Method for depositing thin film. ADVANTAGE - The method maximizes light absorption rate in visible light region when thin film is deposited by supplying graphene oxide as raw material gas. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the method for depositing thin film (Drawing includes non-English language text). Depositing graphene oxide film on the first surface of a substrate (S110) Depositing a first haze film on the graphene oxide film (S130)