▎ 摘　　要

NOVELTY - Method for etching a graphene nanostructure, involves providing a piece of highly oriented pyrolytic graphite including a first window, a second window, and a third window, depositing the DNA sample on the piece of highly oriented pyrolytic graphite, placing the piece of highly oriented pyrolytic graphite in a humidity controlled chamber, applying a relative humidity to the piece of highly oriented pyrolytic graphite, and applying the electrical voltage across the first window and second window. USE - The method is useful for etching a graphene nanostructure (claimed). ADVANTAGE - The method prevents nanoscale resolution of patterns. DETAILED DESCRIPTION - Method for etching a graphene nanostructure, involves providing a piece of highly oriented pyrolytic graphite including a first window, a second window, and a third window, where the first window and second window include one or more electrode contacts configured to receive an electrical voltage, and a portion of the third window includes a reaction area configured to receive a DNA sample, depositing the DNA sample on the piece of highly oriented pyrolytic graphite, where the DNA sample comprises double-stranded DNA or single-stranded DNA, placing the piece of highly oriented pyrolytic graphite in a humidity controlled chamber, applying a relative humidity to the piece of highly oriented pyrolytic graphite, and applying the electrical voltage across the first window and second window.