▎ 摘　　要

NOVELTY - Preparation of graphene-layer deposited silicon dioxide/silicon substrate involves depositing thin-film of crystallized metal catalyst on silicon dioxide/silicon substrate, applying solid carbon source of resultant metal catalyst film, annealing, etching resultant product and removing residue and metal catalyst film. USE - Preparation of graphene-layer deposited silicon dioxide/silicon substrate used for microelectronic device. ADVANTAGE - The method enables preparation of graphene-layer deposited silicon dioxide/silicon substrate having high quality, by simple process within short period of time. The graphene-layer deposited silicon dioxide/silicon substrate enables manufacture of microelectronic device without performing substrate transfer process.