▎ 摘　　要

NOVELTY - The device has an internal thread block (12) that is sleeved on the outer side of a threaded rod (6), and a hose (7) is provided on the top of the internal thread block. The hose and the interior of a collection bin (8) are communicated with each other, and a storage bin is provided on the top of an installation bin (13). A telescopic rod is symmetrically arranged at the top and bottom of the storage bin on the side away from a graphene console main portion (14). The two groups of telescopic rods are provided with a cleaning brush on the side away from the storage bin. The cleaning brush and the graphene console main portion are adapted to each other, and the outer sides of the two sets of telescopic rods are sheathed with springs. The spring and the cleaning brush are connected to each other, and a control panel is provided on one side of the front end of a base (1). The control panel is connected with a first servo motor (9) and a second servo motor (11) through wires. USE - Automatically cleanable graphene semiconductor preparation device. ADVANTAGE - The inclination of the main portion of the graphene operation table allows impurities on the surface of the main portion of the graphene operation table to quickly enter the collection tank for storage, and the cleaning brush is stored when cleaning is not required, thereby improving the work efficiency of the operator. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the automatically cleanable graphene semiconductor preparation device. Base (1) Threaded rod (6) Hose (7) Collection bin (8) First servo motor (9) Second servo motor (11) Internal thread block (12) Installation bin (13) Graphene console main portion (14)