• 专利标题:   Adjustable perfect absorber based on graphene photonic crystal structure, has first cavity that is attached to both surfaces of graphene monolayer, second cavity attached to surface of first and second and third layer on external surface.
  • 专利号:   CN110927843-A
  • 发明人:   CHEN Y, LIU P, ZHA S, LIN M, LIU H
  • 专利权人:   UNIV NAT DEFENSE TECHNOLOGY
  • 国际专利分类:   G02B005/00
  • 专利详细信息:   CN110927843-A 27 Mar 2020 G02B-005/00 202032 Pages: 7 Chinese
  • 申请详细信息:   CN110927843-A CN11338215 23 Dec 2019
  • 优先权号:   CN11338215

▎ 摘  要

NOVELTY - The absorber has a top mirror (1), a bottom mirror (2), and a triple nested fabry-perot (FP) resonant cavity between the top mirror and the bottom mirror. The specific structure of the triple nested FP resonant cavity is graphene monolayer (3). A first layer cavity (4) is attached to the upper and lower surfaces of the graphene monolayer. A second layer cavity (5) is attached to the outer surface of the first layer cavity and is attached to the second layer cavity. The third layer of cavities is provided on the external surface (6). USE - Adjustable perfect absorber based on graphene photonic crystal structure. ADVANTAGE - The absorber can adjust the resonance frequency of the perfect absorption mode by changing the graphene chemical potential and the angle of the incident wave without changing the geometric structure of the absorber. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the adjustable perfect absorber based on graphene photonic crystal structure. Top mirror (1) Bottom mirror (2) Graphene monolayer (3) First layer cavity (4) Second layer cavity (5) External surface (6)