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  • 专利标题:   Preparation of graphene by using performing chemical gas phase deposition into furnace device, setting control gas phase dynamics parameter using computer, and controlling gas phase balance of surface of graphene growth substrate material.
  • 专利号:   CN104773724-A, CN104773724-B
  • 发明人:   HE J, LI C, LI J, LIU C, LU J, ZHANG P, YANG T, LU Z, LU M, LU Y
  • 专利权人:   YULIN TEACHERS COLLEGE, UNIV YULIN NORMAL
  • 国际专利分类:   C01B031/04, C01B032/186
  • 专利详细信息:   CN104773724-A 15 Jul 2015 C01B-031/04 201570 Pages: 7 Chinese
  • 申请详细信息:   CN104773724-A CN10165661 09 Apr 2015
  • 优先权号:   CN10165661

▎ 摘　　要

NOVELTY - Preparation of graphene comprises using performing chemical gas phase deposition into furnace device, setting control gas phase dynamics parameter using computer, and controlling gas phase balance of surface of graphene growth substrate material. USE - Method for preparing graphene (claimed). ADVANTAGE - The method has high quality graphene and uniform graphene growth. The graphene has lesser defects.