• 专利标题:   Copper-based contact material used in low-voltage circuit breaker, contactor and relay, comprises graphene-enhanced copper foam including graphene and copper, where copper foam comprises oxide powder, carbide powder and copper powder.
  • 专利号:   CN104538214-A, CN104538214-B
  • 发明人:   LIN W, LIU L, WENG W
  • 专利权人:   FUDA ALLOY MATERIALS CO LTD
  • 国际专利分类:   C01B031/04, C22C032/00, C22C009/00, C23C016/26, H01H001/025
  • 专利详细信息:   CN104538214-A 22 Apr 2015 H01H-001/025 201547 Pages: 5 Chinese
  • 申请详细信息:   CN104538214-A CN10754620 11 Dec 2014
  • 优先权号:   CN10754620

▎ 摘  要

NOVELTY - A copper-based contact material comprises graphene-enhanced copper foam including graphene and copper. The copper foam comprises oxide powder, carbide powder and balance amount of copper powder or copper alloy powder, and has interconnected pores having foam-like distribution. The oxide powder comprises tin oxide, cuprous oxide, zinc oxide or iron(II) oxide. The carbide powder includes tungsten carbide, silicon carbide, molybdenum carbide or boron carbide. The graphene is evenly distributed in an inner wall of copper foam covering pore surface and outer surface. USE - The copper-based contact material is useful in low-voltage circuit breaker, contactor and relay. ADVANTAGE - The copper-based contact material has low contact resistance, and improved arc resistance and anti-welding performance. DETAILED DESCRIPTION - A copper-based contact material comprises graphene-enhanced copper foam including graphene and copper. The copper foam comprises 0.01-10 wt.% oxide powder, 0.01-2 wt.% carbide powder and balance amount of copper powder or copper alloy powder, and has interconnected pores having foam-like distribution. The oxide powder comprises tin oxide, cuprous oxide, zinc oxide or iron(II) oxide. The carbide powder includes tungsten carbide, silicon carbide, molybdenum carbide or boron carbide. The graphene is evenly distributed in an inner wall of copper foam covering pore surface and outer surface. The thickness of copper foam is 10 nm.