▎ 摘　　要

NOVELTY - Slurry comprises 30-70 wt.% reducing agent, 5-15 wt.% polymer compound, and 15-65 wt.% solvent. USE - The slurry is useful for reducing graphene oxide in preset pattern (claimed). DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) preparing a patterned graphene film layer comprising (1) forming graphene oxide film layer on the substrate, and (2) applying reducing slurry onto the graphene oxide film layer in predetermined pattern, and reducing to obtain graphene film layer having predetermined pattern; and (2) patterned graphene film layer prepared by above mentioned method.