▎ 摘　　要

NOVELTY - Depositing a layer of carbon nanostructures on a substrate, the carbon nanostructures consisting of an array of randomly oriented graphene sheets upstanding on the substrate, involves providing a processing chamber having chamber walls, the processing chamber having a substrate location zone; providing a substrate at the substrate location zone in the processing chamber, internal surfaces of the chamber walls facing the sample location zone; evacuating the processing chamber; providing a processing gas in the processing chamber at a pressure of 1-1000 Pa, the processing gas comprising carbon monoxide gas; creating and sustaining gaseous plasma in the processing chamber for greater than or equal to 1 s, the gaseous plasma having a power density of greater than or equal to 0.1 MW/m3; heating the substrate at greater than or equal to 500 degrees C; maintaining the internal surfaces of the chamber walls at less than or equal to 300 degrees C; and growing the layer of carbon nanostructures on the substrate. USE - The method is useful for depositing a layer of carbon nanostructures on a substrate (claimed). The carbon nanostructures are useful as three-dimensional graphene mesh used in different applications such as light absorbents, fuel cells, super-capacitors, batteries, photovoltaic devices and sensors of specific gaseous molecules. ADVANTAGE - Methods are provided for rapid deposition of randomly distributed graphene sheets on surfaces of substrates using decomposition of carbon monoxide (CO) molecules of a high potential energy, and the excited CO molecules interacting with a substrate. The methods provide a further improved approach to the formation of carbon nanostructures on arbitrary substrates having improved properties. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an apparatus configured to carry out the method above.