• 专利标题:   Depositing layer of carbon nanostructures on substrate by providing substrate in processing chamber, providing processing gas in processing chamber having carbon monoxide gas and creating and sustaining gaseous plasma in processing chamber.
  • 专利号:   WO2021115596-A1, EP4073846-A1, US2023033329-A1, JP2023506422-W
  • 发明人:   ZAPLOTNIK R, MOZETIC M, PRIMC G, VESEL A, HORI M, ODA O
  • 专利权人:   STEFAN JOZEF INST, UNIV NAGOYA NAT CORP, STEFAN INST JOZEF, UNIV TOKAI NAT CORP NAT HIGHER EDUCATION, UNIV TOKAI NAT CORP NAT HIGHER EDUCATION, STEFAN JOZEF INST
  • 国际专利分类:   C23C016/26, C23C016/505, C23C016/54, H01L021/02, H01L029/16, H01M004/04, C01B032/186
  • 专利详细信息:   WO2021115596-A1 17 Jun 2021 202154 English
  • 申请详细信息:   WO2021115596-A1 WOEP084734 11 Dec 2019
  • 优先权号:   EP827662, JP534353, WOEP084734, US17784197

▎ 摘  要

NOVELTY - Depositing a layer of carbon nanostructures on a substrate, the carbon nanostructures consisting of an array of randomly oriented graphene sheets upstanding on the substrate, involves providing a processing chamber having chamber walls, the processing chamber having a substrate location zone; providing a substrate at the substrate location zone in the processing chamber, internal surfaces of the chamber walls facing the sample location zone; evacuating the processing chamber; providing a processing gas in the processing chamber at a pressure of 1-1000 Pa, the processing gas comprising carbon monoxide gas; creating and sustaining gaseous plasma in the processing chamber for greater than or equal to 1 s, the gaseous plasma having a power density of greater than or equal to 0.1 MW/m3; heating the substrate at greater than or equal to 500 degrees C; maintaining the internal surfaces of the chamber walls at less than or equal to 300 degrees C; and growing the layer of carbon nanostructures on the substrate. USE - The method is useful for depositing a layer of carbon nanostructures on a substrate (claimed). The carbon nanostructures are useful as three-dimensional graphene mesh used in different applications such as light absorbents, fuel cells, super-capacitors, batteries, photovoltaic devices and sensors of specific gaseous molecules. ADVANTAGE - Methods are provided for rapid deposition of randomly distributed graphene sheets on surfaces of substrates using decomposition of carbon monoxide (CO) molecules of a high potential energy, and the excited CO molecules interacting with a substrate. The methods provide a further improved approach to the formation of carbon nanostructures on arbitrary substrates having improved properties. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an apparatus configured to carry out the method above.