▎ 摘　　要

NOVELTY - The mirror (1c) has layer arrangement designed in such way that light (32) having wavelength of less than 250 nm that is incident on the mirror portion at specific angle of incidence. The surface layer system (P) of layer arrangement is provided with periodic sequence of two periods of individual layers. The two individual layers are composed of different materials for a high refractive index layer and low refractive index layer. The layer arrangement is provided with one graphene layer (G,SPL,B). USE - Mirror of projection objective used in projection exposure apparatus for microlithography (all claimed). ADVANTAGE - The layer arrangement is provided with one graphene layer, so that the mirror for the extreme UV wavelength range can be achieved even at high doses of UV radiation. The long-time stability and optical properties of the mirror during the operating period can be improved. The loss of stray light can be reduced. The surface roughness of mirror can be reduced by use of graphene. The optical element in the extreme UV wavelength range can be protected against radiation-induced irreversible change. The interdiffusion between multilayer layer mirrors in the extreme UV wavelength range can be prevented. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the mirror. Mirror (1c) Light (32) Graphene layer (G,SPL,B) Surface layer system (P) Substrate (S)