▎ 摘　　要

NOVELTY - A photocatalytic self-cleaning cement material comprises 50-80 %mass tailings, 18-50 %mass cement, 0.01-2 %mass graphene oxide, 0.5-5 %mass semiconductor photocatalyst, and 0.1-0.4 %mass naphthalene based water reducer. USE - Photocatalytic self-cleaning cement material for degrading organic pollutants in water and nitrogen oxides, formaldehyde and sulfide in atmosphere (all claimed). ADVANTAGE - The cement material has excellent mechanical properties such as flexural strength and compressive strength, and has excellent photocatalytic properties due to the addition of semiconductor photocatalyst. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) preparation of the photocatalytic self-cleaning cement material; and (2) application of the photocatalytic self-cleaning cement material.