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  • 专利标题:   Preparation of patterned graphene used for preparing photoelectronic device, comprises uniformly coating solid carbon source on a substance provided with a catalyst and forming high graphic pattern by high-temperature reaction.
  • 专利号:   CN103880001-A
  • 发明人:   HU H, HU L, LI F, YE Y, ZHANG Y, GUO T, WU C, ZHOU X, LIN M
  • 专利权人:   UNIV FUZHOU
  • 国际专利分类:   B82Y030/00, B82Y040/00, C01B031/04, H01L021/02
  • 专利详细信息:   CN103880001-A 25 Jun 2014 C01B-031/04 201457 Pages: 9 Chinese
  • 申请详细信息:   CN103880001-A CN10112147 25 Mar 2014
  • 优先权号:   CN10112147

▎ 摘　　要

NOVELTY - Preparation of patterned graphene comprises uniformly coating solid carbon source on a substance provided with a catalyst; and forming high graphic pattern by high-temperature reaction. USE - Method for preparing patterned graphene used for preparing photoelectronic device (claimed). ADVANTAGE - The method is simple and has high precision and does not pollute and damage the graphene.