• 专利标题:   Pellicle film for extreme ultraviolet lithography, comprises a core layer and a first capping layer and second capping layers that are respectively coupled to upper and lower surfaces of the core layer, and a healing layer is formed on grain boundaries.
  • 专利号:   KR2022129343-A
  • 发明人:   YU L, KIMCHUNG, CHO S J, KIM K S, LEE S Y, SEO K, CHOI J H, MOON S Y, KIM J K
  • 专利权人:   FINE SEMITECH CORP
  • 国际专利分类:   G03F001/22, G03F001/62
  • 专利详细信息:   KR2022129343-A 23 Sep 2022 G03F-001/62 202285 Pages: 12
  • 申请详细信息:   KR2022129343-A KR034115 16 Mar 2021
  • 优先权号:   KR034115

▎ 摘  要

NOVELTY - The film (10) has a core layer (12) and two capping layers (11,13) that are respectively coupled to upper and lower surfaces of the core layer. The core layer is made of zirconium, lanthanum, yttrium, niobium, cerium, rubidium, beryllium, strontium, molybdenum, silicon carbide or silicon dioxide. A healing layer is formed on grain boundaries of a sub-layer made of a polycrystalline material. A recovery layer is provided with a single crystal layer or an amorphous layer, where the recovery layer comprises a material selected from a single element or compound of nitrogen, graphene, carbon nanotubes, graphite, graphene nanoplates and carbon nanosheets. USE - Pellicle film for extreme ultraviolet lithography. ADVANTAGE - The pellicle film prevents penetration of hydrogen radicals, and minimizes damage caused by hydrogen radicals. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the pellicle. 10Pellicle film 11,13Capping layers 12Core layer