• 专利标题:   Electrochemical etching method used for metal substrate involves forming electrically conductive polymer on graphene layer such that metal plate is coupled to graphene layer, then disposing metal substrate layer in electrolyte.
  • 专利号:   US2015267317-A1, US9994968-B2
  • 发明人:   GUO L, HAN S, LI X
  • 专利权人:   INT BUSINESS MACHINES CORP, INT BUSINESS MACHINES CORP
  • 国际专利分类:   C25F003/02, C25F007/00, B32B038/10, C25F005/00, B32B037/24, C01B032/186
  • 专利详细信息:   US2015267317-A1 24 Sep 2015 C25F-003/02 201566 English
  • 申请详细信息:   US2015267317-A1 US666887 24 Mar 2015
  • 优先权号:   US617727, US666887

▎ 摘  要

NOVELTY - The electrochemical etching method involves forming an anode (110) having a graphene layer (118) formed on a metal substrate layer (120), then forming an electrically conductive polymer on the graphene layer such that metal plate is coupled to graphene layer. A metal substrate layer is disposed in electrolyte (115) then a cathode (108) electrically connected to power source (102), is disposed in electrolyte. The graphene layer and metal substrate layer are connected to power source to supply a current through anode and electrolyte such that metal substrate layer is etched from graphene layer. USE - Electrochemical etching method used for metal substrate. ADVANTAGE - Delivers higher current through metal substrate layer without damaging the graphene layer while flowing current flows through the full surface of the graphene layer and the metal substrate layer, since the first end of the wire is connected to the metal plate. Reduces overall etching time since etching time is independent from the remaining thickness of metal substrate layer, thus achieving large scale production of graphene. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an anode forming method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the electrochemical etching apparatus. Power source (102) Cathode (108) Anode (110) Electrolyte (115) Graphene layer (118) Metal substrate layer (120)