▎ 摘　　要

NOVELTY - Method for manufacturing an optical device, involves forming a resist of a predetermined shape on multilayer graphene, and processing the multilayer graphene together with the resist into a tapered shape by anisotropic etching using oxygen, removing the resist covering the inclined end face of the processed multilayer graphene, and providing an electrode covering the exposed inclined end face of the multilayer graphene. USE - The method is used for manufacturing an optical device, light-emitting layer and electrodes for conducting current. ADVANTAGE - The method manufactures optical device in which contact resistance between multilayer graphene and electrodes is reduced.