• 专利标题:   Transferring graphene based on copper foil comprises e.g. adhering the graphene sample on the copper foil substrate by adhesive tape, placing the copper foil graphene sample on the suspension coater, and etching copper base graphene complex.
  • 专利号:   CN111453720-A
  • 发明人:   WU H
  • 专利权人:   NANTONG JINGRUI NEW CARBON MATERIAL TECHNOLOGY CO LTD
  • 国际专利分类:   C01B032/194
  • 专利详细信息:   CN111453720-A 28 Jul 2020 C01B-032/194 202068 Pages: 5 Chinese
  • 申请详细信息:   CN111453720-A CN10059946 22 Jan 2019
  • 优先权号:   CN10059946

▎ 摘  要

NOVELTY - Transferring graphene based on copper foil comprises e.g. (1) adhering the graphene sample on the copper foil substrate by adhesive tape on the cover glass, (2) placing the copper foil graphene sample adhered to the cover glass on the suspension coater, applying two drops of poly(methyl methacrylate) solution, tearing the tape, and removing the cover glass to obtain a copper-based graphene complex layer, (3) etching the copper base graphene complex layer in an ammonium persulfate solution and removing copper base, (4) placing poly(methyl methacrylate) solution graphene in deionized cleaning, (5) using silicon wafer to remove poly(methyl methacrylate) solution-based graphene, adding in a Petri dish, and adding in a vacuum device to vacuum, (6) taking out the sample and heating in a glass Petri dish to soften the poly(methyl methacrylate) and make the graphene and the silicon wafer fit better, and (7) cooling the Petri dish, adding acetone and isopropanol to the Petri dish. USE - The method is useful for transferring graphene based on copper foil. ADVANTAGE - The method: adopts acetone and isopropanol to process silicon wafers; reduces defects e.g. wrinkles and cracks of the graphene after transfer; removes metal particles on the target substrate to the greatest extent; enhances hydrophilicity; and improves the transfer quality of graphene. DETAILED DESCRIPTION - Transferring graphene based on copper foil comprises (1) adhering the graphene sample on the copper foil substrate by adhesive tape on the cover glass, (2) placing the copper foil graphene sample adhered to the cover glass on the suspension coater, applying two drops of poly(methyl methacrylate) solution, tearing the tape, and removing the cover glass to obtain a copper-based graphene complex layer, (3) etching copper base graphene complex layer in an ammonium persulfate solution and removing copper base, (4) placing poly(methyl methacrylate) solution graphene in deionized cleaning, (5) using silicon wafer to remove poly(methyl methacrylate) solution-based graphene, adding in a Petri dish, and adding in a vacuum device to vacuum, (6) taking out the sample and heating in a glass Petri dish to soften the poly(methyl methacrylate) and make the graphene and the silicon wafer fit better, and (7) cooling the Petri dish, adding acetone and isopropanol to the Petri dish to remove the poly(methyl methacrylate) substrate, rinsing with deionized water, and blow drying to obtain graphene on silicon substrate.