• 专利标题:   Directional etching of copper foil for graphene transfer comprises e. g. performing spin-coating on surface of the graphene with polymethyl methacrylate to obtain protective layer, heating and solidifying.
  • 专利号:   CN108439375-A
  • 发明人:   ZHAO P, WANG H, ZHANG X, WU Z, XU C, YIN S
  • 专利权人:   UNIV ZHEJIANG
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN108439375-A 24 Aug 2018 C01B-032/184 201864 Pages: 6 Chinese
  • 申请详细信息:   CN108439375-A CN10226950 15 Mar 2018
  • 优先权号:   CN10226950

▎ 摘  要

NOVELTY - Directional etching of copper foil for graphene transfer comprises e. g. performing spin-coating on the surface of the graphene with polymethyl methacrylate to obtain protective layer, heating and solidifying to obtain polymethyl methacrylate-graphene-copper foil, configuring etching solution to etching copper to form stable electric field in the etching solution, floating the polymethyl methacrylate-graphene-copper foil on the surface of the etching solution, contacting the copper foil with the etching solution, dissolving the copper foil to obtain polymethyl methacrylate-graphene, picking the polymethyl methacrylate-graphene from the solution, placing in deionized water, cleaning, picking up the graphene using the target substrate, drying and reducing the moisture between the graphene and the substrate, drying the moisture, heating the substrate to remove residual moisture between the substrate and the graphene and strengthening the bonding of the graphene to the substrate. USE - The method is useful for directional etching of copper foil for graphene transfer. ADVANTAGE - The method avoids the damage to the graphene. DETAILED DESCRIPTION - Directional etching of copper foil for graphene transfer comprises (i) performing spin-coating on the surface of the graphene with polymethyl methacrylate to obtain protective layer, heating and solidifying to obtain polymethyl methacrylate-graphene-copper foil; (ii) configuring etching solution to etching copper to form stable electric field in the etching solution; (iii) floating the polymethyl methacrylate-graphene-copper foil on the surface of the etching solution, contacting the copper foil with the etching solution, dissolving the copper foil to obtain polymethyl methacrylate-graphene; (iv) picking the polymethyl methacrylate-graphene from the solution by using glass piece, placing in deionized water and cleaning; (v) picking up the graphene using the target substrate, drying and reducing the moisture between the graphene and the substrate; (vi) drying the moisture, heating the substrate to remove residual moisture between the substrate and the graphene and strengthening the bonding of the graphene to the substrate; (vii) removing polymethyl methacrylate on the surface of the graphene using organic solvent to obtain graphene-base sample; and (viii) washing the surface of the graphene-base sample with isopropyl alcohol and drying.