▎ 摘　　要

NOVELTY - The oscillator (8) has a substrate chip which is prepared by etching a silicon wafer. The substrate chip includes the silicon layer at the bottom. The left and right ends of an upper surface of the silicon layer are provided with a silicon dioxide layer. The silicon dioxide layer is provided with a groove. An upper portion of the groove is covered with a graphene film. The graphene film is obtained by mechanically peeling a block-shaped graphite. Two ends of the graphene film are provided to cover a portion of the silicon dioxide layer. The substrate chip and the graphene film are provided to form an optical resonant cavity. USE - Graphene harmonic oscillator for phononic laser. ADVANTAGE - The oscillator has simple preparation technique, low technical difficulty, easy chip integration and batch preparation, stable and controllable phonon laser device for developing acoustic quantum information device, important basic research meaning and wide application prospect. The oscillator realizes information interaction between different quantum information systems and precise measurement field. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the working method of phonon maser based on graphene harmonic oscillator. DESCRIPTION OF DRAWING(S) - The drawing shows an explanatory view of the graphene harmonic oscillator. Driving laser source (1) Graphene harmonic oscillator (8) Nano electric displacement table (9) Beam splitter (10) Filter sheet (12)