▎ 摘　　要

NOVELTY - The processing method involves irradiating a pulse laser to the desired process location of the graphene, and removing the graphene of the desired location (S101). The process location of the graphene is let to be in the state covered with water in the manufacturing process. The water is then deaerated. The process location of the graphene is then made into the atmosphere of the gas made desired in the manufacturing process. USE - Processing method for processing apparatus of graphene (claimed). ADVANTAGE - By irradiating a pulse laser to the desired process location of the graphene, and removing the graphene of the desired location, the graphene can be micro-fabricated without doing damage. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a processing apparatus of graphene. DESCRIPTION OF DRAWING(S) - The drawing shows the flowchart of the processing method of the graphene. (Drawing includes non-English language text). Graphene formation step (S101) Pulse laser irradiation to graphene location step (S102)