• 专利标题:   Chemical vapor deposition method graphene reaction furnace, has gas distributor densely distributed with exhaust holes, where included angle between central line of exhaust hole and side wall of funnel-shaped connecting part is smaller.
  • 专利号:   CN218755040-U
  • 发明人:   BAI Y, FU L, XIE G
  • 专利权人:   UNIV SOUTHWEST PETROLEUM
  • 国际专利分类:   C01B032/186
  • 专利详细信息:   CN218755040-U 28 Mar 2023 C01B-032/186 202331 Chinese
  • 申请详细信息:   CN218755040-U CN23432757 21 Dec 2022
  • 优先权号:   CN23432757

▎ 摘  要

NOVELTY - The utility model claims a CVD method graphene reaction furnace, belonging to the technical field of graphene The reaction furnace comprises a furnace main body, the furnace main body is provided with a growth substrate, one end of the furnace main body is provided with a first funnel-shaped connecting part, one end of the first funnel-shaped connecting part far away from the furnace main body is connected with the air inlet pipe; the smaller end of the first funnel-shaped connecting part is provided with a gas distributor whose section is hemispherical shell; the gas distributor is densely distributed with exhaust holes, the farther from the centre of the gas distributor, the hole diameter of the exhaust hole is larger; the closer to the side wall of the first funnel-shaped connecting part, the included angle between the central line of the exhaust hole and the side wall of the first funnel-shaped connecting part closest to the exhaust hole is smaller. The utility model is provided with a first funnel type connecting part, a gas distributor and an exhaust hole, and defining the setting mode of the exhaust hole, so that the gas finally enters the furnace main body is more uniform, dispersing, so that the finally prepared graphene has better effect. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the CVD method graphene to claim.