• 专利标题:   Substrate useful in applications/manufacture of commercial products including textile products in medical applications/hospitals e.g. aprons, comprises graphene or its derivative.
  • 专利号:   WO2022190021-A1, IN202121010336-A
  • 发明人:   AMIRTHASAMY J B, RAJE V P, GARG V K, SHUKLA M K, REKHI S S
  • 专利权人:   RELIANCE IND LTD
  • 国际专利分类:   C01B032/184, C11D003/48, A61K008/891, B05D003/00, C08G018/10, D06M101/32, D06M011/83
  • 专利详细信息:   WO2022190021-A1 15 Sep 2022 C11D-003/48 202278 Pages: 40 English
  • 申请详细信息:   WO2022190021-A1 WOIB052132 10 Mar 2022
  • 优先权号:   IN21010336

▎ 摘  要

NOVELTY - Substrate comprises 0.0001-10 wt.% graphene or its derivative, where the substrate is characterized by a feature comprising electrical resistance, electrical resistivity, antimicrobial, antistatic, antiodor, wicking, thermal cooling and ultraviolet protection. USE - The substrate is useful in applications/manufacture of commercial products including textile products in medical applications/hospitals e.g. aprons, garments, furniture covers, bed covers, pillow covers, curtains, other apparels, upholstery, carpets and bags. ADVANTAGE - The substrate: shows several further beneficial properties including good/excellent washing fastness, rubbing fastness, perspiration fastness, sublimation fastness and light fastness even after multiple washes of the fabric at low concentrations of graphene and/or its derivatives; has enhanced antimicrobial, bactericidal, antibacterial effect, bacteriostatic effect, antiviral effect, antifungal effect, washing fastness, perspiration fastness, sublimation fastness, light fastness of 4-5 ultraviolet protection as compared to unprocessed fabrics and water absorbency of 0.1-5 seconds; provides excellent stability to the fabric after repeated washing cycles; and is economical, repeatable and commercially/industrially viable process for production. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing the substrate, comprising preparing graphene slurry, and printing the substrate with the graphene slurry to obtain the substrate.