• 专利标题:   Manufacture of graphene involves transferring base component comprising support layer, separation layer, and catalyst metal layer into chamber, passing carbon vapor source into chamber, and cooling base component.
  • 专利号:   KR2012010643-A, KR1451139-B1
  • 发明人:   CHO S M, WON D K
  • 专利权人:   SAMSUNG TECHWIN CO LTD
  • 国际专利分类:   C01B031/02, C23C016/26
  • 专利详细信息:   KR2012010643-A 06 Feb 2012 C01B-031/02 201308 Pages: 12
  • 申请详细信息:   KR2012010643-A KR071063 22 Jul 2010
  • 优先权号:   KR071063

▎ 摘  要

NOVELTY - Base component comprising support layer, separation layer formed on support layer, and catalyst metal layer formed on separation layer, is transferred into chamber, carbon vapor source is passed into the chamber to increase the internal temperature of the chamber, and then, base component is cooled, to form graphene layer. The ratio of maximum temperature (Tc) of support layer in chamber, and melting temperature (Tmp) of support layer is less than 0.6. USE - Manufacture of graphene. ADVANTAGE - The method provides graphene having high quality and productivity.