• 专利标题:   Ultra-high sensitive graphene sensor, has silicon substrate provided with drain electrode and gate electrode, where voltage is applied on drain electrode from outside and gate electrode is fixed with dielectric layer.
  • 专利号:   KR2013134538-A
  • 发明人:   JUN S C, LIM J, YOUN H S, OH J Y, JUNG Y M, PARK H G
  • 专利权人:   UNIV YONSEI IND ACADEMIC COOP FOUND
  • 国际专利分类:   G01N027/02, G01N027/12
  • 专利详细信息:   KR2013134538-A 10 Dec 2013 G01N-027/02 201402 Pages: 13
  • 申请详细信息:   KR2013134538-A KR058123 31 May 2012
  • 优先权号:   KR058123

▎ 摘  要

NOVELTY - The sensor has a dielectric layer adhered on a groove that is formed on a silicon substrate. The silicon substrate is provided with a gate electrode that is fixed with the dielectric layer. The gate electrode is inserted into the groove. Two ends of a source electrode are fixed with a graphene layer. The graphene layer is adhered on a top surface of the silicon substrate. The silicon substrate is provided with a drain electrode, where voltage is applied on the drain electrode from outside. The silicon substrate is provided with a silicon oxide film. USE - Ultra-high sensitive graphene sensor. ADVANTAGE - The sensor ensures better working performance and high sensitivity. The sensor realizes control of charge quantity of a graphene surface, so that responsivity of the sensor can be appropriately tuned and gaseous species can be absorbed. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an ultra-high sensitive graphene sensor manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a top perspective view of an ultra-high sensitive graphene sensor.