• 专利标题:   Method for preparing graphene functionalized silicon-based probe, involves forming metal carbide shell layer structure in silicone probe surface under catalysis of metal element surface, and quenching silicone probe to obtain graphene functionalized silicon probe.
  • 专利号:   CN114217097-A
  • 发明人:   CHANG Z, WANG J, XU J, ZHAO Y, LU M
  • 专利权人:   NAT CENT NANOSCIENCE TECHNOLOGY CHINA
  • 国际专利分类:   G01Q060/38, G01Q060/42, G01Q070/16, G01Q070/18
  • 专利详细信息:   CN114217097-A 22 Mar 2022 G01Q-060/38 202281 Chinese
  • 申请详细信息:   CN114217097-A CN11401739 19 Nov 2021
  • 优先权号:   CN11401739

▎ 摘  要

NOVELTY - The method involves plating a carbon layer on a silicon probe surface to form a carbon layer. A metal is plated on the carbon layer, where the metal is selected from combination of nickel, copper and gold. A metal plating layer is formed. Silicon probes are immersed in liquid-butyl-3-methylimidazole acetate ion. A metal carbide shell layer structure is formed in the silicone probe surface under catalysis of a metal element surface. The silicone probe is quenched to obtain a graphene functionalized silicon probe. Thickness of the carbon layer is calculated about 3nm to 20nm. USE - Method for preparing a graphene functionalized silicon-based probe (claimed). ADVANTAGE - The method enables preparing the graphene functionalized silicon-based probe with excellent needle tip sharpness, conductive performance and oxidation resistance. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a graphene functionalized silicon-based probe. (Drawing includes non-English language text).