• 专利标题:   Filling holes of graphene thin film, comprises preparing graphene thin film, filling aromatic compound or nano-carbon material into graphene thin film holes and combining aromatic compound or nano-carbon material with holes by heat treating.
  • 专利号:   KR1506892-B1
  • 发明人:   HAN J H
  • 专利权人:   UNIV CHONNAM NAT IND FOUND
  • 国际专利分类:   B01J006/00, C01B031/02
  • 专利详细信息:   KR1506892-B1 30 Mar 2015 C01B-031/02 201526 Pages: 7
  • 申请详细信息:   KR1506892-B1 KR124416 18 Oct 2013
  • 优先权号:   KR124416

▎ 摘  要

NOVELTY - Filling holes of graphene thin film, comprises (a) preparing graphene thin film, (b) filling aromatic compound or nano-carbon material in the holes present in graphene thin film, and (c) combining aromatic compound or nano-carbon material with the holes by heat treating the holes filled graphene thin film. The nano-carbon material includes at least one of fullerene, carbon nanotube, carbon black and nano-diamond. The aromatic compound includes at least one of aromatic compound having at least two benzene rings and their derivatives. USE - The method is useful for filling holes of graphene thin film (claimed). ADVANTAGE - The method minimizes defects in the graphene thin film. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for graphene thin film having holes filled by the above method.