• 专利标题:   Preparing antimony tungstate modified graphene carbon trinitro-tetra composite photocatalyst, comprises e.g. heating dicyandiamide, dissolving, adding antimony trichloride, sodium tungstate complex and water, then reacting, and washing.
  • 专利号:   CN108273534-A
  • 发明人:   ZHANG S, ZHANG B, LIANG Z
  • 专利权人:   ZHENJIANG CHUANGZHI SPECIAL ALLOY TECHNO
  • 国际专利分类:   B01J027/24, B01J037/08, B01J037/10, C02F001/30, C02F101/30
  • 专利详细信息:   CN108273534-A 13 Jul 2018 B01J-027/24 201855 Pages: 6 Chinese
  • 申请详细信息:   CN108273534-A CN11479425 29 Dec 2017
  • 优先权号:   CN11479425

▎ 摘  要

NOVELTY - Preparing antimony tungstate modified graphene carbon trinitro-tetra composite photocatalyst, comprises (i) adding dicyandiamide into a crucible, and heating in a high temperature tubular furnace to obtain graphitic carbon nitride, (ii) dissolving 2 g graphitic carbon nitride in 40 ml ethylene glycol solution, (iii) adding antimony trichloride into the solution obtained in step (ii), and stirring uniformly, (iv) adding sodium tungstate complex (Na2WO6) into the solution obtained in step (iii), and stirring uniformly, (v) adding 20 ml water into the solution obtained in step (iv), and stirring uniformly, (vi) placing the stirred solution into the reaction kettle, then reacting, and (vii) centrifugal washing the complete reacted sample, then drying and grinding. USE - The method is useful for preparing antimony tungstate modified graphene carbon trinitro-tetra composite photocatalyst. ADVANTAGE - The tetra composite photocatalyst: has excellent photocatalytic performance; and promotes research of new semiconductor graphitic carbon nitride photocatalyst.