• 专利标题:   Method for recycling silicon carbide substrate, involves preparing graphene layer on silicon carbide substrate to form first silicon carbide composite substrate followed by growing epitaxial layer on silicon carbide composite substrate.
  • 专利号:   CN110164811-A
  • 发明人:   ZHANG X, SONG D, CHENG H, NIU Y, YUAN S, LIU J
  • 专利权人:   WUHU QIDI SEMICONDUCTOR CO LTD
  • 国际专利分类:   H01L021/683, H01L029/66
  • 专利详细信息:   CN110164811-A 23 Aug 2019 H01L-021/683 201975 Pages: 11 Chinese
  • 申请详细信息:   CN110164811-A CN10435385 23 May 2019
  • 优先权号:   CN10435385

▎ 摘  要

NOVELTY - A silicon carbide substrate recycling method involves preparing a graphene layer on the silicon carbide substrate to form a first silicon carbide composite substrate, growing a first epitaxial layer on the first silicon carbide composite substrate, separating the first epitaxial layer from the first silicon carbide composite substrate to obtain a second epitaxial layer and a second substrate and performing surface treatment on the separated second substrate to obtain a recyclable silicon carbide liner bottom. USE - Method for recycling silicon carbide substrate. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method of manufacturing a gallium nitride high-electron-mobility transistor device.