▎ 摘　　要

NOVELTY - The pellicle has a central layer (10,11) that is composed of a core layer made of nano-particles, a support layer pattern (28a) that is formed by etching the support layer and supports the central layer, and a shadow mask layer formed between the support and central layers using the support pattern as an etch mask. The central layer is made of carbon nanotube, graphite, graphene, boron nitride and shadow mask. A layer pattern comprises single crystal, polycrystalline or amorphous silicon, and silicon compound containing oxygen, carbon, nitrogen, chromium, aluminum, chromium nitride, cobalt, aluminum oxide, tungsten, molybdenum, vanadium, palladium, titanium, platinum, manganese, iron, nickel, cadmium, zirconium, magnesium, lithium, selenium, copper, indium, tin, beryllium, terbium, tantalum, Hydrogen fluoride, niobium, ruthenium, praseodymium, lanthanum, tellurium, rhodium, and europium. USE - Pellicle for extreme ultraviolet lithography. ADVANTAGE - The pellicle has excellent transmittance of 88% or more and uniformity of 0.04% or less. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method of manufacturing a pellicle for extreme ultraviolet lithography. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view showing a pellicle for extreme ultraviolet lithography. Central layer (10,11) Capping layers (12) Pellicle frame (20) Etch stop layer pattern (24a) Support layer pattern (28a)