▎ 摘　　要

NOVELTY - Preparing flexible two-dimensional thin film solar cell, involves: 1) fabricating flexible thin film solar cell substrate by: (a) spin coating defoamed poly (acrylic acid) mixture on polished silicon wafer, so that spin-coated thickness is 400-500 microns; (b) forming polyimide film, soaking in water, peeling film from silicon chip and drying, and fixing to substrate; (c) spin-coating mixture of polyethylene oxide and silver nitrate on substrate; (d) etching electrode array, by laser; 2) fabricating cell structure by: (a) plasma treating cell substrate ; (b) pouring titanium dioxide into isopropanol, printing on electron transport layer formed by electro-jet printing; (c) mixing bis trifluoromethanesulfonylimide lithium solution, tributyl phosphate and spirobifluorene derivative, printing on hole transport layer formed by electro-jet printing; (d) forming perovskite film from dimethyl fluoride, dimethyl sulfoxide, lead iodide and methylammonium iodide; (e) forming film from prepolymer. USE - Method is used for preparing flexible two-dimensional film solar cell. ADVANTAGE - The method enables preparing flexible two-dimensional film solar cell having high light transmittance, by simple operation, in cost-effective manner, without need to rely on ultra-clean room equipment. DETAILED DESCRIPTION - Preparing a flexible two-dimensional (2D) thin film solar cell, involves: 1) fabricating flexible 2D thin film solar cell substrate by: (a) mixing poly (acrylic acid) (PAA) solution and multi-walled carbon nanotubes, in weight ratio 95-100:1, performing defoaming treatment, spin coating defoamed PAA mixture on surface of polished silicon wafer, so that spin-coated thickness is 400-500 microns; (b) heating PAA spin-coated silicon chip and solidifying, to form a polyimide film, soaking in deionized water for 10-15 minutes, peeling off the polyimide film from the silicon chip and drying, and fixing dry polyimide film to glass as polyimide substrate; (c) adding polyethylene oxide (PEO) powder to silver nitrate solution, stirring and configuring PEO/silver nitrate mixture of concentration 0.1-0.15 mg/ml, spin-coating mixture on polyimide substrate, to thickness 200-250 microns, drying film to form polyimide substrate of PEO/silver nitrate film; (d) adopting carbon dioxide laser ablation, etching graphene electrode array on substrate surface, where graphene electrode array comprises two groups, and each group comprises several mutually parallel graphene electrodes, alternately arranging graphene electrodes in two groups of graphene electrode arrays, at intervals, to connect the ends of the graphene electrodes in each group, the width of each graphene electrode, is 0.8-1 mm and thickness is 235-295 microns, distance between electrodes is 0.4-0.5mm; 2) fabricating flexible two-dimensional thin film solar cell structure, by: (a) subjecting side of the flexible two-dimensional thin film solar cell substrate with the PEO/silver nitrate film, to oxygen plasma treatment; (b) pouring titanium dioxide into isopropanol solution, configuring as 80-90 mg/ml electron transport layer solution, stirring fully and pouring into electro-jet printing nozzle and connecting nozzle with graphite substrate of flexible two-dimensional thin film solar cell, aligning graphene electrodes, printing electron transport layer by electric jet, on graphene electrodes of one group of graphene electrode arrays, where electron transport layer has width 1-1.2 mm and thickness 200-300 nm, annealing thin-film solar cell substrates in oven; (c) pouring bistrifluoromethanesulfonylimide lithium into acetonitrile solution, to configure 5-6 mg/ml bistrifluoromethanesulfonylimide lithium solution, pouring spirobifluorene derivative (spiro-OMeTAD) into chlorobenzene solution, to configure 72-73 mg/ml spiro-OMeTAD solution, configuring trifluoromethanesulfonylimide lithium solution, tributyl phosphate and spiro-OMeTAD solution in volume ratio (18-20): (29-30): (1 -2), stirring, to form hole transport layer solution, pouring hole transport layer solution into electro-jet printing nozzle, aligning nozzle with graphene electrode on the substrate of the flexible two-dimensional thin film solar cell, printing a hole transport layer with electric jet, so that layer has width 1-1.2 mm and thickness 200-300 nm; (d) configuring dimethyl fluoride (DMF) and dimethyl sulfoxide (DMSO) in volume ratio 4-5:1. to form DMF/DMSO solution, configuring lead iodide (PbI2) and methylammonium iodide (MAI), in weight ratio 2-3:1, to form PbI2/MAI powder, pouring PbI2-MAI powder into DMF-DMSO solution, configuring as 640-650 mg/ml perovskite solution, spin-coating perovskite solution on flexible two-dimensional thin-film solar cell substrate, medium annealing flexible two-dimensional thin-film solar cell substrate, after spin coating, to form perovskite film of thickness 400-500 nm; (e) mixing polydimethyl siloxane (PDMS) prepolymer and curing agent in volume ratio 9-10:1, mixing toluene and PDMS mixed solution in volume ratio 4-5:1, and spin coating on flexible two-dimensional thin film solar cell substrate, forming PDMS film after drying, having thickness 20-30 microns;