▎ 摘　　要

NOVELTY - Chemical vapor deposition device comprises a reaction unit for performing chemical vapor deposition reaction. A carbon source feeding unit provides a gaseous carbon source for the reaction unit. A vacuum monitoring unit controls and detects the vacuum degree of the reaction unit. The carbon source feeding unit includes an atomizer and a vaporizer. USE - Chemical vapor deposition device for preparing graphene film. ADVANTAGE - By designing a carbon source feeder with a simple structure, the traditional injection pump method, bubbling method and heating method are replaced, so that the control of the carbon source is more precise and stable, and the production cost is reduced. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a chemical vapor deposition method comprising atomizing treatment, vaporizing treatment to obtain gaseous carbon source, and introducing the gaseous carbon source and carrier gas into the reactor for chemical vapor deposition reaction, preparing graphene film on the substrate. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of a chemical vapor deposition device for preparing graphene film. Liquid carbon source tank (11) Input flow pump (12) Atomizer (13) Vaporizing chamber (14) Temperature controllable heat preservation bath (15) Reactor (20) Substrate (21) Air inlet end (22) Exhaust end (23) Hydrogen tank (31) Flow meter (32) Protective gas tank (33) Flow meter (34) Air inlet pipeline (35) Vacuum detecting component (41) Vacuum pump (42)