▎ 摘　　要

NOVELTY - Storage device comprises a substrate, where the substrate is provided with a two-dimensional material layer with a folding structure. The 2D material layer is transferred to the substrate through a polymer layer. The substrate is adhered between the polymer layer and the substrate, firstly by heat treatment, and secondly by quenching treatment. The polymer layer is different from the heat expansion coefficient of the substrate. USE - Storage device e.g. solid state hard disk (SSD) based on pleated two-dimensional (2D) material used in fifth generation (5G) , internet of things (IoT) and artificial intelligence (AI) technology. ADVANTAGE - The memory device prepared based on the wrinkle type two-dimensional material has multiple resistance state, large storage window, high switch ratio, high stability and good repeatability. The material preparation method is simple, the storage device has simple structure, only using single layer material to realize the storage function, further improving the integration degree of the system. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for preparing a memory device, which involves: (a) forming a wrinkled structure on the two-dimensional material layer; (b) making the two-dimensional material layer adhere to the polymer between the material layer and the substrate; (c) performing first heat treatment and then quenching treatment are performed to form a wrinkled structure on the two-dimensional material layer. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view an optical microscope photo of the two-dimensional Molybdenum disulfide (MoS2) layer.