▎ 摘　　要

NOVELTY - The method involves preparing a graphene film on a supporting substrate. A metal nano-particle is prepared on a surface of a graphene etching a graphene nano-particle mask etching pattern. A metal nano-particle mask is removed on the graphene. A nitride material is grown on the graphene. The graphene film is prepared on the support substrate by chemical vapour deposition or liquid phase stripping. The support substrate comprises a nitride heterogeneous epitaxial substrate or a nitride single crystal template. The nitride single crystal template comprises aluminum nitride or gallium nitride single crystal. USE - Method for preparing two-dimensional nanometer patterned substrate in material synthesis technology field (Claimed). ADVANTAGE - The method provides a high production efficiency, pattern size design flexibility and sample surface clean two-dimensional nano-patterned substrate. The method is simple and feasible, the cost can be effectively controlled, and suitable for large size, batch construction. The geometric parameters such as nano pattern size has high flexible adjustability, and has important promoting effect for the subsequent high quality nitride material of the lateral epitaxy. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the method for preparing two-dimensional nanometer patterned substrate (Drawing includes non-English language text).