▎ 摘　　要

NOVELTY - The fabrication method involves forming a channel in substrate (100), and forming a sacrificial layer (202) in the channel. A sensor with first dielectric layer (302) on substrate, graphene layer (304) on first dielectric layer, and second dielectric layer (306) on graphene layer, a source region (402), a drain region (404), and a gate region is formed. The gate region is disposed on sacrificial layer. The sacrificial layer is removed from the channel. The graphene layer includes a graphene tube. The sacrificial layer includes silicon germanium. The substrate is buried oxide substrate. USE - Fabrication method for forming sensor e.g. graphene biosensor used in life sciences, clinical diagnostics, and medical research for affinity based sensing such as hybridization between complementary single strand DNA in microarray or affinity binding of matched antibody-antigen pair. ADVANTAGE - Improves sensitivity of the device due to relatively thin first dielectric layer between the fluid in flow path and graphene layer. Allows first dielectric layer to be formed to desired thickness by forming the first dielectric layer on the substrate. Maintains desired sensitivity of the device by forming the fluid flow path so that fluid contacts the thinner first dielectric layer rather than the thicker second dielectric layer. DESCRIPTION OF DRAWING(S) - The drawing shows a cross sectional view of the method for forming a graphene sensor. Substrate (100) Sacrificial layer (202) First dielectric layer (302) Graphene layer (304) Second dielectric layer (306) Source region (402) Drain region (404)